Manufacturing novel optical sensors for data centers, telecom networks, high-speed computing for artificial intelligence, or LiDAR components for next-generation autonomous driving requires a reliable, robust, and flexible manufacturing technology. One key solution for efficient production of novel photonic devices is Nanoimprint Lithography. It enables the structuring of an entire wafer in a single process step. Moreover, SmartNIL® technology allows for aligned imprinting on functional surfaces as well as partial imprinting in combination with inkjet coating. The optical structures are fully functional directly after imprinting and can range from sub-μm up to several microns in height. We will present the entire process flow for wafer structing with the main characteristics of the technology, including recent applications.
Jonas Khan is the team leader of the SmartNIL® Development Team within EV Group's Process Technology Division. With over 10 years of experience in process development and a background in construction and electrical engineering, he is now improving EVG's Nanoimprint Lithography (NIL) technology from equipment to process and materials. He and his team are currently implementing the inkjet printing technology at EVG. Jonas graduated from the University of Applied Sciences in Karlsruhe, Germany, where he studied Sensor Systems Technology in collaboration with RMIT in Melbourne, Australia. In particular, he focused on microfabrication processes for optical components using lithium niobate.